Modeling the I-V Characteristics of the Thin Film Pt/BaxSr1-xTiO3/Pt Structure under the Electron Beam Irradiation
Electronics
Abstract
A new model of the I-V characteristics based on the Schottky field-assisted and the PoolFrenkel emission effects under the simultaneous influence of electron beam radiation on ferroelectric films is proposed. Numerical calculations and the results of mathematical modeling of the I-V characteristics carried out for different values of Pt/BaxSt1-xTiO3/Pt (Pt/BST/Pt) thin film structure parameters are presented when the film is irradiated by an electron beam of different flux. The theoretical estimations of the emission process indicate that the Pool-Frenkel emission is compatible with the Schottky field emission mechanism. Due to the presence of electron irradiation, the Pool-Frenkel emission takes place in the range of lower voltages. The analysis of the I-V characteristics indicates that the trapping centers can beactivated at very low (in spite of classical theory, exceeding 106 V/cm) electric fields (103…104 V/cm) due to the existence of the electron beam irradiation. From the practical point of view, the further understanding of the mechanism of the trapping/detrapping process can allow to characterize the I-V behavior, hysteresis effects, the noise, capacitance and other effects in the Pt/BSTO/Pt structures. The proposed theory may be useful for the analysis and modeling of the parameters and physical processes taking place in other similar provskite oxide - based structures.